Prof. Hongjin FAN
Associate Professor
School of Physical & Mathematical Sciences
Nanyang Technological University
21 Nanyang Link, Singapore 637371
Email : fanhj@ntu.edu.sg Group: www.ntu.edu.sg/home/fanhj
Dr. Fan is currently an associate professor at Nanyang Technological University (NTU). He received PhD from National University of Singapore in 2003, followed by postdoc at Max-Planck-Institute of Microstructure Physics, Germany and University of Cambridge. He joined in NTU as faculty since 2008. Dr. Fan’s expertise include semiconductor nanowires, energy conversion and storage applications of nanomaterials (including photoelectrochemical cells for solar water splitting, batteries and supercapacitors). He is also interested in solar cells and general photonics of semiconducting low-D materials. He is particularly reputed for his work in atomic layer deposition (ALD) for energy research. Dr. Fan has published more than 140 journal papers, with an H-index of 45. He is an editorial board member of Nanotechnology and Scientific Reports, advisory board member of Advanced Science, Advanced Materials Interface, and Associate Editor of Materials Research Bulletin.
ACADEMIC BACKGROUND
02/2014 – Now: Associated Professor, Nanyang Technological University, Singapore
08/2008 – 02/2014: Nanyang Assistant Professor, Nanyang Technological University, Singapore
06/2006 - 08/2008: Research Associate, University of Cambridge, UK
01/2003 – 06/2006: Postdoc, Max-Planck-Institute of Microstructure Physics, Germany
EDUCATION
09/1999 – 12/2002: PhD, National University of Singapore, Department of Physics
1995 – 1999: B.Sc, Jilin University (China), Department of Physics
ACADEMIC SERVICE
Journal Editorship or Board membership
Conference Organization
Society Membership (Solicited)
1. Materials Research Society Singapore (MRS-S) Committee member (since 2011)
2. Institute of Physics, Singapore (IPS) Council member (since 2010)
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